A 0.18-μm fabrication process is specified to have tox = 4 nm, μn = 450 cm2/V⋅s, and Vthn = 0.5 V. The dielectric constant of the silicon dioxide is 3.9. Find the value of the process transconductance parameter. For a MOSFET with minimum length fabricated in this process, find the required value of W so that the device exhibits a channel resistance rDS of 1 kΩ at vGS = 1 V. Ans. 388 μA/V2; 0.93 μm.
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