For a CMOS process with Lmin = 0.18 μm, tox = 4.1 nm, μn = 460 cm2/V⋅s, and Vt = 0.373 V. Express Cox in F/m2 and fF/(μm)2. The gate dielectric is SiO2. a) (7pts) Find Cox and kn' b) (7pts) For an NMOS transistor with a W/L of 60 , calculate the values of Vov, VGS, and VDSmin needed to operate the transistor in the saturation region with a DC current of 0.8 mA. c) (6pts) For the device in b) find the value of Vov and VGS required to cause the device to operate as a 500 ohm resistor for a very small VDS.

For a CMOS process with Lmin = 0.18 μm, tox = 4.1 nm, μn = 460 cm2/V⋅s, and Vt = 0.373 V. Express Cox in F/m2 and fF/(μm)2. The gate dielectric is SiO2. a) (7pts) Find Cox and kn' b) (7pts) For an NMOS transistor with a W/L of 60 , calculate the values of Vov, VGS, and VDSmin needed to operate the transistor in the saturation region with a DC current of 0.8 mA. c) (6pts) For the device in b) find the value of Vov  and VGS required to cause the device to operate as a 500 ohm resistor for a very small VDS.

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For a CMOS process with Lmin = 0.18 μm, tox = 4.1 nm, μn = 460 cm2/V⋅s, and Vt = 0.373 V. Express Cox in F/m2 and fF/(μm)2. The gate dielectric is SiO2. a) (7pts) Find Cox and kn' b) (7pts) For an NMOS transistor with a W/L of 60 , calculate the values of Vov, VGS, and VDSmin needed to operate the transistor in the saturation region with a DC current of 0.8 mA. c) (6pts) For the device in b) find the value of Vov and VGS required to cause the device to operate as a 500 ohm resistor for a very small VDS.

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