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If the DIBL characteristic length is 29.1 nm for a CMOS process with Toxe = 27 Å, Wdmax = 56 nm, and Xj = 64 nm, then what will the new value of the DIBL characteristic length be in nanometers if Toxe is scaled down (reduced) by 54.3% ?

If the DIBL characteristic length is 29.1 nm for a CMOS process with Toxe = 27 Å, Wdmax = 56 nm, and Xj = 64 nm, then what will the new value of the DIBL characteristic length be in nanometers if Toxe is scaled down (reduced) by 54.3% ?

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If the DIBL characteristic length is 29.1 n m for a CMOS process with Toxe = 27 Å Å , W d m a x = 56 n m , and X j = 64 n m , then what will the new value of the DIBL characteristic length be in nanometers if Toxe is scaled down (reduced) by 54.3 % ?

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